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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Bottom-up/top-down high resolution, high throughput lithography using vertically assembled block bottle brush polymers
Trefonas, Peter, Thackeray, James W., Sun, Guorong, Cho, Sangho, Clark, Corrie, Verkhoturov, Stanislav V., Eller, Michael J., Li, Ang, Pavía-Jiménez, Adriana, Schweikert, Emile A., Wooley, Karen L., SVolume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2014528
File:
PDF, 3.45 MB
english, 2013