Photomasks for Semiconductor Lithography: From Simple...

Advances in Science and Technology 2008 Vol. 55

Photomasks for Semiconductor Lithography: From Simple Shadow Casters to Complex 3D Scattering Objects

Erdmann, Andreas, Reibold, David, Fühner, Tim, Evanschitzky, Peter
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Volume:
55
Year:
2008
Language:
english
Journal:
Advances in Science and Technology
DOI:
10.4028/www.scientific.net/AST.55.173
File:
PDF, 859 KB
english, 2008
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