SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Flying plasmonic lens at near field for high speed nanolithography
Pan, Liang, Park, Yong-Shik, Xiong, Yi, Ulin-Avila, Erick, Zeng, Li, Sun, Cheng, Bogy, David B., Zhang, Xiang, Herr, Daniel J. C.Volume:
7637
Year:
2010
Language:
english
DOI:
10.1117/12.848370
File:
PDF, 1.50 MB
english, 2010