SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Photoresist film thickness for extreme ultraviolet lithography
Dentinger, Paul M., Cardinale, Gregory F., Henderson, Craig C., Fisher, Aaron, Ray-Chaudhuri, Avijit K., Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390098
File:
PDF, 1.43 MB
english, 2000