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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - High absorbing resists based on trifluoromethacrylate-vinyl ether copolymers for EUV lithography
Christianson, Matthew D., Meyer, Matthew M., Ongayi, Owendi, Valeri, David, Wagner, Michael, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2014385
File:
PDF, 1.38 MB
english, 2013