SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Fully automated hot embossing processes utilizing high resolution working stamps
Glinsner, T., Veres, T., Kreindl, G., Roy, E., Morton, K., Wieser, T., Thanner, C., Treiblmayr, D., Miller, R., Lindner, P., Herr, Daniel J. C.Volume:
7637
Year:
2010
Language:
english
DOI:
10.1117/12.846841
File:
PDF, 3.22 MB
english, 2010