Comparison of liquid- and vapor-phase silylation processes...

Optical Engineering 1993 Vol. 32; Iss. 10

Comparison of liquid- and vapor-phase silylation processes for 193-nm positive-tone lithography

Hartney, Mark A.
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Volume:
32
Year:
1993
Language:
english
Journal:
Optical Engineering
DOI:
10.1117/12.146843
File:
PDF, 378 KB
english, 1993
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