Leveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes
Rana, Narender, Zhang, Yunlin, Kagalwala, Taher, Bailey, ToddVolume:
13
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.13.4.041415
Date:
December, 2014
File:
PDF, 2.83 MB
english, 2014