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SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography
Schwartzkopf, George, MacDonald, Scott A.Volume:
920
Year:
1988
Language:
english
DOI:
10.1117/12.968301
File:
PDF, 275 KB
english, 1988