SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - UV-LED exposure system for low-cost photolithography
Lai, Kafai, Erdmann, Andreas, Yapici, Murat Kaya, Farhat, IlyasVolume:
9052
Year:
2014
Language:
english
DOI:
10.1117/12.2046123
File:
PDF, 605 KB
english, 2014