SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Extreme ultraviolet resist outgassing and its effect on nearby optics
Denbeaux, Gregory, Garg, Rashi, Mbanaso, Chimaobi, Waterman, Justin, Yankulin, Leonid, Antohe, Alin, Fan, Yu-Jen, Montgomery, Warren, Dean, Kim, Orvek, Kevin, Wüest, Andrea, Wei, Yayi, Goodwin, Frank,Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772670
File:
PDF, 175 KB
english, 2008