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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Impact of photo-induced species in O2-containing gases on lithographic patterning at 193-nm wavelength
Okoroanyanwu, Uzodinma, Kunze, Peter, Al-Shamery, Katharina H., Romero, Jeremias, Bernard, Joffre, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474623
File:
PDF, 734 KB
english, 2002