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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Optimized glass-ceramic substrate materials for EUVL applications
Mitra, Ina, Alkemper, Jochen, Mueller, Rolf, Nolte, Uwe, Engel, Axel, Hack, Hrabanus, Kohlmann, Heiko, Wittmer, Volker, Pannhorst, Wolfgang, Davis, Mark J., Aschke, Lutz, Knapp, Konrad, Mackay, R. ScoVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.535193
File:
PDF, 259 KB
english, 2004