Reaction Mechanism of the Two-Step MOCVD of Copper Thin...

Electrochemical and Solid-State Letters 2005 Vol. 8; Iss. 11

Reaction Mechanism of the Two-Step MOCVD of Copper Thin Film Using Cu(hfac)[sub 2]⋅H[sub 2]O Source

Lee, Chiapyng, Lee, Hsin-Hung, Yen, Yee-Wen, Kuo, Yu-Lin
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Volume:
8
Year:
2005
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2052050
File:
PDF, 111 KB
english, 2005
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