Reduced Contact Resistance and Improved Surface Morphology...

Japanese Journal of Applied Physics 2011 / 4 Vol. 50; Iss. 4

Reduced Contact Resistance and Improved Surface Morphology of Ohmic Contacts on GaN Employing KrF Laser Irradiation

Wang, Grace Huiqi, Wong, Ting-Chong, Wang, Xin-cai, Zheng, Hong-Yu, Chan, Taw-Kuei, Osipowicz, Thomas, Foo, Yong-Lim, Tripathy, Sudhiranjan
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.04DF06
Date:
April, 2011
File:
PDF, 1.50 MB
english, 2011
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