![](/img/cover-not-exists.png)
Growth and microstructure properties of microcrystalline silicon films deposited using jet-ICPCVD
Zuo, Zewen, Guan, Wentian, Xin, Yu, Lu, Jin, Wang, Junzhuan, Pu, Lin, Shi, Yi, Zheng, YoudouVolume:
32
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/32/3/032001
Date:
March, 2011
File:
PDF, 412 KB
english, 2011