Interaction of F atoms with SiOCH ultra-low-...

Journal of Physics D Applied Physics 2015 / 05 Vol. 48; Iss. 17

Interaction of F atoms with SiOCH ultra-low- k films: I. Fluorination and damage

Rakhimova, T V, Lopaev, D V, Mankelevich, Yu A, Rakhimov, A T, Zyryanov, S M, Kurchikov, K A, Novikova, N N, Baklanov, M R
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Volume:
48
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/48/17/175203
Date:
May, 2015
File:
PDF, 718 KB
english, 2015
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