SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - High-accuracy critical-dimension metrology using a scanning electron microscope
Lowney, Jeremiah R., Vladar, Andras E., Postek, Jr., Michael T., Jones, Susan K.Volume:
2725
Year:
1996
Language:
english
DOI:
10.1117/12.240108
File:
PDF, 494 KB
english, 1996