SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Study of silylation mechanisms and kinetics through variations in silylating agent and resin
Dao, T. T., Spence, Chris A., Hess, Dennis W., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46377
File:
PDF, 365 KB
english, 1991