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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Tailoring of novolac resins for photoresist applications using a two-step synthesis procedure
Baehr, Guenther, Westerwelle, Ulrich, Gruetzner, Gabi, Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275905
File:
PDF, 1.28 MB
english, 1997