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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Nanocomposite liquids for 193 nm immersion lithography: a progress report
Chumanov, George, Evanoff, Jr., David D., Luzinov, Igor, Klep, Viktor, Zdryko, Bogdan, Conley, Will, Zimmerman, Paul, Sturtevant, John L.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.601479
File:
PDF, 118 KB
english, 2005