Formation of rippled surface morphology during Si/Si (100)...

Chinese Physics B 2011 / 12 Vol. 20; Iss. 12

Formation of rippled surface morphology during Si/Si (100) epitaxy by ultrahigh vacuum chemical vapour deposition

Hu, Wei-Xuan, Cheng, Bu-Wen, Xue, Chun-Lai, Su, Shao-Jian, Wang, Qi-Ming
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Volume:
20
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/20/12/126801
Date:
December, 2011
File:
PDF, 965 KB
english, 2011
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