![](/img/cover-not-exists.png)
Role of CF 2 in the etching of SiO 2 , Si 3 N 4 and Si in fluorocarbon plasma
Lele, Chen, Liang, Zhu, Linda, Xu, Dongxia, Li, Hui, Cai, Tod, PaoVolume:
30
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/30/3/033005
Date:
March, 2009
File:
PDF, 179 KB
english, 2009