SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion
Dentinger, Paul M., Taylor, James W., Seeger, David E.Volume:
2723
Year:
1996
Language:
english
DOI:
10.1117/12.240476
File:
PDF, 276 KB
english, 1996