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SPIE Proceedings [SPIE Dresden, Germany - Dresden (Tuesday 5 January 2027)] 21st European Mask and Lithography Conference - TRAVIT: software tool to simulate dry etch in maskmaking
Babin, S., Bay, K., Okulovsky, S., Behringer, Uwe F. W.Volume:
5835
Year:
2005
Language:
english
DOI:
10.1117/12.637291
File:
PDF, 346 KB
english, 2005