Self-aligned reduction lithography using backside exposure...

Journal of Micromechanics and Microengineering 2011 / 07 Vol. 21; Iss. 7

Self-aligned reduction lithography using backside exposure through embedded masks

Gottron, Norman J, Yellen, Benjamin B
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Volume:
21
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/21/7/075022
Date:
July, 2011
File:
PDF, 300 KB
english, 2011
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