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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Fabrication of submicron topology with ion- and neutral-beam etching
Soshnikov, Ilja P., Lunev, Alexander V., Gaevski, M. E., Rotkina, Lolita G., Bert, Nicolai A., Seeger, David E.Volume:
3048
Year:
1997
Language:
english
DOI:
10.1117/12.275806
File:
PDF, 162 KB
english, 1997