SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Experimental study of proximity effect corrections in electron-beam lithography
Zhu, Jianguo, Cui, Zheng, Prewett, Philip D., Warlaumont, John M.Volume:
2437
Year:
1995
Language:
english
DOI:
10.1117/12.209175
File:
PDF, 302 KB
english, 1995