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Effect of Bias Temperature Stress on the Anti-Reflection HfO 2 Layer in Complementary Metal Oxide Semiconductor Image Sensors
Kim, Hyung-Joon, Lee, Kyung-Su, Choi, Pyungho, Kim, Kwang-Soo, Baek, Dohyun, Choi, ByoungdeogVolume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.10MC02
Date:
October, 2013
File:
PDF, 272 KB
english, 2013