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Uniformity of TiN Films Fabricated by Hollow Cathode Discharge
Haifu, Jiang, Chunzhi, Gong, Xiubo, Tian, Shiqin, Yang, Fu, R. K. Y, Chu, P. KVolume:
12
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/12/2/16
Date:
April, 2010
File:
PDF, 658 KB
english, 2010