SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Stress mitigation in Mo/Si multilayers for EUV lithography
Zoethout, Erwin, Sipos, G., van de Kruijs, R. W., Yakshin, Andrey E., Louis, Eric, Muellender, Stefan, Bijkerk, Fred, Engelstad, Roxann L.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.490138
File:
PDF, 176 KB
english, 2003