Electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry for the direct determination of trace amounts of impurities in slurries of silicon carbide
Peng Tianyou, Chang Gang, Sheng Xiaohai, Jiang Zucheng, Hu BinVolume:
433
Year:
2001
Language:
english
Pages:
8
DOI:
10.1016/s0003-2670(01)00780-2
File:
PDF, 112 KB
english, 2001