SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography
Echigo, Masatoshi, Oguro, Dai, Henderson, Clifford L.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.813487
File:
PDF, 2.08 MB
english, 2009