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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission
Farrow, Reginald C., Blakey, Myrtle I., Kasica, Richard J., Liddle, James A., Mkrtchyan, Masis M., Novembre, Anthony E., Peabody, Jr., Milton L., Saunders, Thomas E., Windt, David L., Zurbrick, LarryVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308730
File:
PDF, 3.04 MB
english, 1998