Performance of Integrated Cu Gap-Filling Process with...

Japanese Journal of Applied Physics 2013 / 05 Vol. 52; Iss. 5S3

Performance of Integrated Cu Gap-Filling Process with Chemical Vapor Deposition Cobalt Liner

Kokaze, Yutaka, Kodaira, Shuji, Endo, Youhei, Hamaguchi, Junichi, Harada, Masamichi, Kumamoto, Shouichirou, Sakamoto, Yuta, Higuchi, Yasushi
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.05FA01
Date:
May, 2013
File:
PDF, 2.30 MB
english, 2013
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