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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - New lithography technology for sub-10nm patterning with shrinking organic material
Resnick, Douglas J., Bencher, Christopher, Morita, SeijiVolume:
9049
Year:
2014
Language:
english
DOI:
10.1117/12.2046307
File:
PDF, 642 KB
english, 2014