Reduction of residual stress in extreme ultraviolet Mo/Si...

Optical Engineering 2001 / 03 Vol. 40; Iss. 3

Reduction of residual stress in extreme ultraviolet Mo/Si multilayer mirrors with postdeposition thermal treatments

Montcalm, Claude
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Volume:
40
Language:
english
Journal:
Optical Engineering
DOI:
10.1117/1.1346584
Date:
March, 2001
File:
PDF, 207 KB
english, 2001
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