Wave Propagation and Plasma Uniformity in an Electron...

Japanese Journal of Applied Physics 1993 / 6 Vol. 32; Iss. Part 1, No

Wave Propagation and Plasma Uniformity in an Electron Cyclotron Resonance Plasma Etch Reactor

Stevens, James E., Cecchi, Joseph L.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.3007
Date:
June, 1993
File:
PDF, 416 KB
english, 1993
Conversion to is in progress
Conversion to is failed