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Wave Propagation and Plasma Uniformity in an Electron Cyclotron Resonance Plasma Etch Reactor
Stevens, James E., Cecchi, Joseph L.Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.3007
Date:
June, 1993
File:
PDF, 416 KB
english, 1993