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Low-Temperature Preparation of Metallic Ruthenium Films by MOCVD Using Bis(2,4-dimethylpentadienyl)ruthenium
Kawano, Kazuhisa, Kosuge, Hiroaki, Oshima, Noriaki, Funakubo, HiroshiVolume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2717367
File:
PDF, 142 KB
english, 2007