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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - A convenient method to measure the quantity of the acid generated by PAGs and acid amplifiers
Wang, Liyuan, Chu, Zhanxing, Sheng, Liying, Sturtevant, John L.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.599107
File:
PDF, 154 KB
english, 2005