Consecutive and Selective Chemical Vapor Deposition of...

Japanese Journal of Applied Physics 2013 / 10 Vol. 52; Iss. 10S

Consecutive and Selective Chemical Vapor Deposition of Pt/Al Bilayer Electrodes for TiO 2 Resistive Switching Memory

Park, Heejung, Go, Seunghee, Lee, Chiyoung, Nam, Hoseok, Lee, Jong-Kwon, Lee, Jaegab
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.10MC08
Date:
October, 2013
File:
PDF, 321 KB
english, 2013
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