SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Advances in directed self assembly integration and manufacturability at 300 mm
Rathsack, Benjamen, Somervell, Mark, Muramatsu, Makato, Tanouchi, Keiji, Kitano, Takahiro, Nishimura, Eiichi, Yatsuda, Koichi, Nagahara, Seiji, Iwaki, Hiroyuki, Akai, Keiji, Ozawa, Mariko, Romo NegreiVolume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2012018
File:
PDF, 1.26 MB
english, 2013