Exposure strategy and crystallization of Ge-Sb-Te thin film by maskless phase-change lithography
Ni, Ri Wen, Zeng, Bi Jian, Huang, Jun Zhu, Luo, Teng, Li, Zhen, Miao, Xiang ShuiVolume:
54
Language:
english
Journal:
Optical Engineering
DOI:
10.1117/1.oe.54.4.045103
Date:
April, 2015
File:
PDF, 2.98 MB
english, 2015