A Self-Aligned Two-Step Reactive Ion Etching Process for Nanopatterning Magnetic Tunnel Junctions on 300 mm Wafers
Xue, Lin, Nistor, Lavinia, Ahn, Jaesoo, Germain, Jonathan, Ching, Chi, Balseanu, Mihaela, Trinh, Cong, Chen, Hao, Hassan, Sajjad, Pakala, MahendraVolume:
50
Language:
english
Journal:
IEEE Transactions on Magnetics
DOI:
10.1109/TMAG.2014.2322351
Date:
November, 2014
File:
PDF, 692 KB
english, 2014