SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - PAG segregation during exposure affecting innate material roughness
Fedynyshyn, Theodore H., Astolfi, David K., Cabral, Alberto, Roberts, Jeanette, Lin, QinghuangVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.713892
File:
PDF, 537 KB
english, 2007