Dynamics of Mass-Limited Laser Plasma Targets as Sources...

Japanese Journal of Applied Physics 2002 / 6 Vol. 41; Iss. Part 1, No

Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

Keyser, Christian, Bernath, Robert, Al-Rabban, Moza, Richardson, Martin
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.41.4070
Date:
June, 2002
File:
PDF, 2.45 MB
english, 2002
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