Effect of Radio-Frequency and Low-Frequency Bias Voltage on the Formation of Amorphous Carbon Films Deposited by Plasma Enhanced Chemical Vapor Deposition
Manis-Levy, Hadar, Livneh, Tsachi, Zukerman, Ido, Mintz, Moshe H., Raveh, AviVolume:
16
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/16/10/09
Date:
October, 2014
File:
PDF, 732 KB
english, 2014