Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.084002
Date:
August, 2014
File:
PDF, 1.72 MB
english, 2014