SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Analysis of the relation between exposure parameters and critical dimension by response surface model
Sohn, Dong-Soo, Sohn, Young-Soo, Bak, Heungin, Oh, Hye-Keun, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436822
File:
PDF, 701 KB
english, 2001