SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Probing limits of acoustic nanometrology using coherent extreme ultraviolet light
Nardi, Damiano, Hoogeboom-Pot, Kathleen M., Hernandez-Charpak, Jorge N., Tripp, Marie, King, Sean W., Anderson, Erik H., Murnane, Margaret M., Kapteyn, Henry C., Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2011194
File:
PDF, 1.04 MB
english, 2013